FTA-T-02 HONEYWELL
FTA-T-02 HONEYWELL
FTA-T-02 HONEYWELL
TDLS200新型TruePeak波长可变半导体激光分析仪是一款坚固耐用的过程分析仪,根据气体近红外吸收理论,可以在高温高压等恶劣工艺环境下实现快速、精确的测量,还可以在腐蚀性、刺激性及高粉尘浓度等恶劣条件下进行测量。
TruePeak波长可变半导体激光分析仪TDLS200适用于现场分析,尤其是压力或温度变化的测量环境。最大工艺压力为20bar绝对压力,最大工艺温度为1500℃,响应速度快(2~20秒),而且在多数应用中均具有抗干扰特性。
在高达1500℃的工艺温度下,可测量一氧化碳(CO),浓度范围低至ppm级检测限制、高至百分比级;以及二氧化碳(CO2)。该分析仪还可以在含氯和碳氢化合物等具有腐蚀性、刺激性的工艺气体流路中,进行ppm级别的水分测量。
当激光通过待测气体时,TruePeak分析仪通过测量吸收的激光量分析气体浓度。传感器不接触工艺气体,而且没有可动部件,所以平均故障间隔时间更高,维护成本更低。
配备多种灵活的安装可选项,而且具有在线诊断的性能。采用波长可变半导体激光作为单色光源具有以下优点: 灵敏度高;选择性强,可分离单独的吸收线;以及在高粉尘浓度的环境中也可进行光学测量的能力。
这款新型过程分析仪坚固耐用。不仅适用于高温高压的测量环境,还可以在腐蚀性、刺激性及高粉尘浓度等恶劣条件下进行测量。
TruePeak波长可变半导体激光分析仪TDLS200是体型小巧的独立机型,4´20的真空荧光显示器可滚动查看信息,或使用带键盘的7英寸彩色显示器。该分析仪还提供各种接口,如以太网、USB通信接口,安全或者危险区域均可使用。
TruePeak波长可变半导体激光分析仪TDLS200具有3个可配置4-20mA输出,2个用于温度和压力补偿的4-20mA输入,以及继电器输出,包括报警/故障继电器,和用于验证或流路切换的3阀驱动。
新型TruePeak波长可变半导体激光分析仪TDLS200能够进行精确的在线工艺测量,由于在燃烧控制中可以通过精确连续的测量过量氧气及一氧化碳优化燃烧工艺,因此是这种应用的理想选择。
而且,对一氧化碳进行低至ppm级别的连续精确的测量,可以精确并连续优化空燃比。
TruePeak波长可变半导体激光分析仪TDLS200还可用于监视CO、CH4和水分,确认燃烧器熄火以及工艺管泄漏;测量火炬管线、烷基化装置和天然气装置的氧气;在流化催化裂化装置中,为了安全性和催化剂再生对CO和O2进行监视;在催化重整工艺中,检测碳氢化合物中低至ppm级别的水分。
standard open fieldbuses and can be mixed
Simultaneous connection of 4 high-speed fieldbuses (max. 12 MBd)
Simple engineering: configuration, commissioning and diagnostics using only the same tool CBF (Control Build F) software
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Access to all information from the field including equipment management information
Global database of fieldbus devices, control levels and HMI (Human Machine Interface) usage systems
Module identification with production operating parameters
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complete self-diagnosis
Compact and robust design

Front Panel Wiring
DIN rail (U-shaped) installation well can be directly wall mounted, simple and convenient
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Allowable operating ambient temperature…60 C, with automatic temperature monitoring
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EMC (Electromagnetic Compatibility) according to EN50082
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Certifications: CE, NAMUR, CSA, CSA-NRT
Glossary
Process station:
This term is used to describe AC800F controllers (field controllers) and rack-mounted controllers. A process station can be designed to be redundant
configuration and non-redundant configuration.
AC800F :
This term is used to describe the AC800F Field Controller type of process station. A redundant process station consists of 2
AC800F controller.
Rack mounted process station:
This term is used to describe a rack-mounted type of process station. A redundant process station contains 2 rack-mounted CPUs.
This term is used to describe a single, non-redundant process station.
In the investment of modern automation system, due to the hardware equipment department
It only takes up less cost in the whole system, then write engineering applications
The cost of software becomes increasingly important. Generally speaking, a self
The engineering application software cost of the automation project accounts for about the entire project.
About 50%, it is not difficult to see that the migration of cost structure creates a lot of innovation for users.
Create an opportunity to optimize project investment, therefore, it is necessary to start from